Edge list

Results from ConceptNet 5.8

Source: OpenCyc 2012
en barrier nitride stressor creation (n)
― IsA ⟶
Weight: 1.0
en microfabrication (n) Source: OpenCyc 2012
en physical vapor deposition (n)
― IsA ⟶
Weight: 1.0
en microfabrication (n) Source: OpenCyc 2012
en deliberately producing semiconductor (n)
― IsA ⟶
Weight: 1.0
en microfabrication (n) Source: OpenCyc 2012
en microfabrication (n)
― IsA ⟶
Weight: 1.0
en processing (n) Source: OpenCyc 2012
en semiconductor wafer processing (n)
― IsA ⟶
Weight: 1.0
en microfabrication (n) Source: OpenCyc 2012
en microfabrication (n)
― IsA ⟶
Weight: 1.0
en configuring (n) Source: OpenCyc 2012
en contact creation (n)
― IsA ⟶
Weight: 1.0
en microfabrication (n) Source: OpenCyc 2012
en thin film vacuum deposition (n)
― IsA ⟶
Weight: 1.0
en microfabrication (n) Source: OpenCyc 2012
en microfabrication (n)
― IsA ⟶
Weight: 1.0
en member of processings configurings (n) Source: OpenCyc 2012
en microfabrication (n)
― IsA ⟶
Weight: 1.0
en configuring (n) Source: OpenCyc 2012
en silicide creation (n)
― IsA ⟶
Weight: 1.0
en microfabrication (n) Source: OpenCyc 2012
en deliberately producing integrated circuit (n)
― IsA ⟶
Weight: 1.0
en microfabrication (n) Source: OpenCyc 2012
en thin film deposition (n)
― IsA ⟶
Weight: 1.0
en microfabrication (n) Source: OpenCyc 2012
en microfabrication (n)
― IsA ⟶
Weight: 1.0
en member of processings configurings (n) Source: OpenCyc 2012
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