en
wafer deposition
(n)
|
― IsA ⟶
Weight: 1.0
|
en
thin film deposition
(n)
|
Source: OpenCyc 2012
|
en
copper electroplating
(n)
|
― IsA ⟶
Weight: 1.0
|
en
thin film deposition
(n)
|
Source: OpenCyc 2012
|
en
epitaxy
(n)
|
― IsA ⟶
Weight: 1.0
|
en
thin film deposition
(n)
|
Source: OpenCyc 2012
|
en
copper electroplating
(n)
|
― IsA ⟶
Weight: 1.0
|
en
thin film deposition
(n)
|
Source: OpenCyc 2012
|
en
industrial thin film electroplating
(n)
|
― IsA ⟶
Weight: 1.0
|
en
thin film deposition
(n)
|
Source: OpenCyc 2012
|
en
copper electroplating
(n)
|
― IsA ⟶
Weight: 1.0
|
en
thin film deposition
(n)
|
Source: OpenCyc 2012
|
en
chemical vapor deposition
(n)
|
― IsA ⟶
Weight: 1.0
|
en
thin film deposition
(n)
|
Source: OpenCyc 2012
|
en
thin film vacuum deposition
(n)
|
― IsA ⟶
Weight: 1.0
|
en
thin film deposition
(n)
|
Source: OpenCyc 2012
|
en
thin film deposition
(n)
|
― IsA ⟶
Weight: 1.0
|
en
microfabrication
(n)
|
Source: OpenCyc 2012
|
en
atomic layer deposition
(n)
|
― IsA ⟶
Weight: 1.0
|
en
thin film deposition
(n)
|
Source: OpenCyc 2012
|
en
thin film vacuum deposition
(n)
|
― IsA ⟶
Weight: 1.0
|
en
thin film deposition
(n)
|
Source: OpenCyc 2012
|