ConceptNet 5: Query results

en photoresist exposure ⁽ⁿ⁾	― IsA ⟶ Weight: 1.0	en semiconductor wafer processing ⁽ⁿ⁾	Source: OpenCyc 2012
en semiconductor wafer processing ⁽ⁿ⁾	― IsA ⟶ Weight: 1.0	en microfabrication ⁽ⁿ⁾	Source: OpenCyc 2012
en semiconductor wafer processing single wafer ⁽ⁿ⁾	― IsA ⟶ Weight: 1.0	en semiconductor wafer processing ⁽ⁿ⁾	Source: OpenCyc 2012
en wafer deposition ⁽ⁿ⁾	― IsA ⟶ Weight: 1.0	en semiconductor wafer processing ⁽ⁿ⁾	Source: OpenCyc 2012
en semiconductor wafer processing ⁽ⁿ⁾	― IsA ⟶ Weight: 1.0	en processing ⁽ⁿ⁾	Source: OpenCyc 2012
en photolithography semiconductor ⁽ⁿ⁾	― IsA ⟶ Weight: 1.0	en semiconductor wafer processing ⁽ⁿ⁾	Source: OpenCyc 2012
en lot processing step ⁽ⁿ⁾	― IsA ⟶ Weight: 1.0	en semiconductor wafer processing ⁽ⁿ⁾	Source: OpenCyc 2012
en modification ⁽ⁿ⁾	― IsA ⟶ Weight: 1.0	en semiconductor wafer processing ⁽ⁿ⁾	Source: OpenCyc 2012
en masking reticle projection ⁽ⁿ⁾	― IsA ⟶ Weight: 1.0	en semiconductor wafer processing ⁽ⁿ⁾	Source: OpenCyc 2012
en removal ⁽ⁿ⁾	― IsA ⟶ Weight: 1.0	en semiconductor wafer processing ⁽ⁿ⁾	Source: OpenCyc 2012
en semiconductor wafer processing ⁽ⁿ⁾	― IsA ⟶ Weight: 1.0	en transformation process ⁽ⁿ⁾	Source: OpenCyc 2012